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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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!colspan="1" border="none" style="background:silver; color:black;" align="center"|<!--<b>-->Recipe name </b>
!colspan="1" border="none" style="background:silver; color:black;" align="center"|<!--<b></b>-->Recipe name  
|style="background:silver; color:black"|<b>Target material</b>
|style="background:silver; color:black"|<b>Target material</b>
|style="background:silver; color:black"|<b>Pressure (mTorr)</b>
|style="background:silver; color:black"|<b>Pressure (mTorr)</b>
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|}
|}


==Substrate heating==
==Substrate heating==


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