Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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!style="background:silver; color:black;" align="center" |MD PC1 Src2 RF Upstream | !style="background:silver; color:black;" align="center" |MD PC1 Src2 RF Upstream | ||
|style="background:LightGrey; color:black" align="center"|'''SiO<sub>2</sub>'''<!--< | |style="background:LightGrey; color:black" align="center"|'''SiO<sub>2</sub>'''<!--<b>--> | ||
|style="background:WhiteSmoke; color:black" align="center"|3 | |style="background:WhiteSmoke; color:black" align="center"|3 | ||
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|style="background:WhiteSmoke; color:black" align="center"|3 | |style="background:WhiteSmoke; color:black" align="center"|3 | ||
|style="background:WhiteSmoke; color:black" align="center"|500 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs | |style="background:WhiteSmoke; color:black" align="center"|500 (PDC)<br><b>Frequency: </b>100Hz<br><b>Reverse time:</b> 2µs | ||
|style="background:WhiteSmoke; color:black" align="center"|1.7 | |style="background:WhiteSmoke; color:black" align="center"|1.7 | ||
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|style="background:WhiteSmoke; color:black" align="center"|3.4 | |style="background:WhiteSmoke; color:black" align="center"|3.4 | ||
|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm | |style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow: </b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm | ||
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|style="background:WhiteSmoke; color:black" align="center"|3 | |style="background:WhiteSmoke; color:black" align="center"|3 | ||
|style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs | |style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency: </b>100Hz<br><b>Reverse time:</b> 2µs | ||
|style="background:WhiteSmoke; color:black" align="center"|11 | |style="background:WhiteSmoke; color:black" align="center"|11 | ||
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|style="background:WhiteSmoke; color:black" align="center"|3 | |style="background:WhiteSmoke; color:black" align="center"|3 | ||
|style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs | |style="background:WhiteSmoke; color:black" align="center"|140 (PDC)<br><b>Frequency: </b>100Hz<br><b>Reverse time:</b> 2µs | ||
|style="background:WhiteSmoke; color:black" align="center"|11.3 | |style="background:WhiteSmoke; color:black" align="center"|11.3 | ||
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|style="background:WhiteSmoke; color:black" align="center"|- | |style="background:WhiteSmoke; color:black" align="center"|- | ||
|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 2 sccm | |style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow: </b>50sccm<br><b>O<sub>2</sub> flow:</b> 2 sccm | ||
|- | |- | ||
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|style="background:WhiteSmoke; color:black" align="center"|3 | |style="background:WhiteSmoke; color:black" align="center"|3 | ||
|style="background:WhiteSmoke; color:black" align="center"|900 (PDC)<br><b>Frequency:</b>100Hz<br><b>Reverse time:</b> 2µs | |style="background:WhiteSmoke; color:black" align="center"|900 (PDC)<br><b>Frequency: </b>100Hz<br><b>Reverse time:</b> 2µs | ||
|style="background:WhiteSmoke; color:black" align="center"|29 | |style="background:WhiteSmoke; color:black" align="center"|29 | ||
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|style="background:WhiteSmoke; color:black" align="center"|3.2 | |style="background:WhiteSmoke; color:black" align="center"|3.2 | ||
|style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow:</b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm | |style="background:WhiteSmoke; color:black" align="center"|<b>Ar flow: </b>50sccm<br><b>O<sub>2</sub> flow:</b> 15 sccm | ||
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|} | |} | ||