Jump to content

Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

← Older editNewer edit →
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 442: Line 442:




!colspan="1" border="none" style="background:silver; color:black;" align="center"|Target size
!colspan="1" border="none" style="background:silver; color:black;" align="center"|Recipe name
|style="background:silver; color:black"|<b>Target material</b>
|style="background:silver; color:black"|<b>Target material</b>
|style="background:silver; color:black"|<b>Pressure (mTorr)</b>
|style="background:silver; color:black"|<b>Pressure (mTorr)</b>
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system"