Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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<gallery caption="Deposition rates of HfO2 at different temperaturs. ALD window." widths="800px" heights=" | <gallery caption="Deposition rates of HfO2 at different temperaturs. ALD window." widths="800px" heights="200px" perrow="1"> | ||
image:Kaempe_Lesker_standard_recipe_name.png| Deposition rate of HfO<sub>2</sub> at 150 <sup>o</sup>C. Substrate: Silicon 6" wafer with native oxide. | image:Kaempe_Lesker_standard_recipe_name.png| Deposition rate of HfO<sub>2</sub> at 150 <sup>o</sup>C. Substrate: Silicon 6" wafer with native oxide. | ||
</gallery> | </gallery> | ||