Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
Appearance
| Line 31: | Line 31: | ||
= | =Tool architecture= | ||
Bla bla | == Sputter-System Metal-Oxide(PC1) == | ||
Bla bla | |||
= Sputter-System Metal-Oxide(PC3) = | = Sputter-System Metal-Oxide(PC3) = | ||