Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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|30<!-- NH3 [sccm] --> | |30<!-- NH3 [sccm] --> | ||
|<!-- N2O [sccm] --> | |<!-- N2O [sccm] --> | ||
| | |1470<!-- N2 [sccm] --> | ||
|850 mTorr<!-- Pressure [mTorr] --> | |850 mTorr<!-- Pressure [mTorr] --> | ||
|100HF8.2"/100LF2.2"<!-- Power [W] --> | |100HF8.2"/100LF2.2"<!-- Power [W] --> | ||