LabAdviser/Technology Research/Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications: Difference between revisions
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==Relevant technology details== | ==Relevant technology details== | ||
Several fabrication technologies have been developed and optimized, which are listed as below. | Several fabrication technologies have been developed and optimized during the ph.d. project, which are listed as below. | ||
Plasma etching process have been performed mostly on the DRIE-Pegasus system. High aspect ratio structures, 3D structures and black silicon have been fabricated, technology details are accessible in the following pages: | Plasma etching process have been performed mostly on the DRIE-Pegasus system. High aspect ratio structures, 3D structures and black silicon have been fabricated, technology details are accessible in the following pages: | ||