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DCH-Employees-701, NLAB-LabmanagerAllUsers
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DCH-Employees-701, NLAB-LabmanagerAllUsers
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===Publications as co-author ===
===Publications as co-author ===
:;'''Inductively coupled plasma nanoetching of atomic layer deposition alumina'''
*;'''Inductively coupled plasma nanoetching of atomic layer deposition alumina'''


:Han, A., <u>Chang, B.</u>, Todeschini, M., Le, H. T., Tiddi, W., and Keil, M.
:Han, A., <u>Chang, B.</u>, Todeschini, M., Le, H. T., Tiddi, W., and Keil, M.


:Microelectronic Engineering (2018) [https://doi.org/10.1016/j.mee.2018.02.023  DOI]
:Microelectronic Engineering (2018) [https://doi.org/10.1016/j.mee.2018.02.023  DOI]
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