LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes/Electron-Beam Lithography on Organic Ice Resists: Difference between revisions
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==Multi-layers== | ==Multi-layers== | ||
[[File:Multilayer_OIR.png|400px]] | |||
The unique patterning setup (all-in-one) allowed complex in-situ deposition strategies. EBL routines for multi-layer and three-dimensional structuring were demonstrated. This opened up a wide range of possible directions to pursue in the future with this technique. | The unique patterning setup (all-in-one) allowed complex in-situ deposition strategies. EBL routines for multi-layer and three-dimensional structuring were demonstrated. This opened up a wide range of possible directions to pursue in the future with this technique. | ||
==Etching== | ==Etching== | ||
As other organic lithographic resists, OIR patterns are able to withstand the chemical and physical action of reactive species protecting the underlying material, while the surrounding areas are gradually removed. | |||
We initially demonstrated this process to create silicon nanostructures on the sample surface. The silicon etch consisted of a two-phase Bosch process iterating an isotropic etching step based on SF6 plasma and a sidewall passivation step. For nonane ice patterns, selectivity over silicon was 1:6, which is the same value obtained with AR-N 7520. | |||
We then used similar samples made from silicon wafers with a layer of silicon oxide thermally grown on its surface. We structured the SiO2 layer using patterned OIR features as mask in one of our cleanroom's oxide RIE tools for photoresist. The recipe consisted in a single step, a continuous flow etch based on C4F8. The oxide etch process resulted in rougher and more shallow lines, due to limited etch resistance. The selectivity for the SiO2 RIE was 1:1.6; the corresponding value for AR-N 7520 was not measured since the profiles were not satisfying, requiring further optimization. | |||
==Diamond Nanofabrication== | ==Diamond Nanofabrication== | ||