LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes/SEM-LEO Customizations for Organic Ice Resists: Difference between revisions
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Only the load-lock (and, occasionally, a RGA) are permanently installed since they do not affect the SEM chamber volume nor regular operation. Hence, the first step for OIR lithography is to mount the cryosystems and the GIS, and the last step is to unmount them. Instructions regarding the ice lithography setup assembly, operation and control using the rack interfaces is available through training videos. | Only the load-lock (and, occasionally, a RGA) are permanently installed since they do not affect the SEM chamber volume nor regular operation. Hence, the first step for OIR lithography is to mount the cryosystems and the GIS, and the last step is to unmount them. Instructions regarding the ice lithography setup assembly, operation and control using the rack interfaces is available through training videos. | ||
===For information, contact:=== | |||
* [mailto:dizhao@dtu.dk Ding Zhao (PostDoc)] | * [mailto:dizhao@dtu.dk Ding Zhao (PostDoc)] | ||
* [mailto:annaels@dtu.dk Anna Elsukova (PostDoc)] | * [mailto:annaels@dtu.dk Anna Elsukova (PostDoc)] | ||