LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes: Difference between revisions
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*: [https://doi.org/10.1021/acs.nanolett.7b04190 Link to Article] | *: [https://doi.org/10.1021/acs.nanolett.7b04190 Link to Article] | ||
*: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, P. Liu, M. Beleggia, and A. Han<br> ''Nano Letters'', vol. 17, pp. 7886-7891, 2017. | *: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, P. Liu, M. Beleggia, and A. Han<br> ''Nano Letters'', vol. 17, pp. 7886-7891, 2017. | ||
** '''Overview:''' [[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy/Electron-Beam Lithography on Organic Ice Resists|Electron-Beam Lithography on Organic Ice Resists]] | |||
*; Organic ice resists for 3D electron-beam processing - Instrumentation and operation | *; Organic ice resists for 3D electron-beam processing - Instrumentation and operation | ||
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*: [https://doi.org/10.1016/j.mee.2018.01.021 Link to Article] | *: [https://doi.org/10.1016/j.mee.2018.01.021 Link to Article] | ||
*: <u>W. Tiddi</u>, A. Elsukova, M. Beleggia, and A. Han<br> ''Microelectronic Engineering'', vol. 192, pp. 38-43, 2018. | *: <u>W. Tiddi</u>, A. Elsukova, M. Beleggia, and A. Han<br> ''Microelectronic Engineering'', vol. 192, pp. 38-43, 2018. | ||
** '''Overview:''' [[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy/SEM-LEO Customizations for Organic Ice Resists|SEM-LEO Customizations for Organic Ice Resists]] | |||
*; Inductively coupled plasma nanoetching of atomic layer deposition alumina | *; Inductively coupled plasma nanoetching of atomic layer deposition alumina | ||