LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes: Difference between revisions
| Line 64: | Line 64: | ||
Physical dimension of integrated circuits keep shrinking at exponential rates, due market demand for faster, more powerful, longer-lasting and more compact electronic devices. Standard fabrication techniques manage to keep up the pace, but need to resort to extremely expensive equipment, increased fabrication complexity and intense research for dedicated chemicals satisfying the tightening process constraints. | Physical dimension of integrated circuits keep shrinking at exponential rates, due market demand for faster, more powerful, longer-lasting and more compact electronic devices. Standard fabrication techniques manage to keep up the pace, but need to resort to extremely expensive equipment, increased fabrication complexity and intense research for dedicated chemicals satisfying the tightening process constraints. | ||
Ice lithography is a nanopatterning technique derived from electron beam lithography, showing feature resolution below 10nm. A thin ice layer condensed on the sample takes the role of the lithographic resist film when exposed to electron or ion beams. This process is immensely cheaper and more sustainable than state-of-the-art techniques relying on physical masks and aggressive chemistries. | Ice lithography is a nanopatterning technique derived from electron beam lithography, showing feature resolution below 10nm. A thin water ice layer condensed on the sample takes the role of the lithographic resist film when exposed to electron or ion beams. This process is immensely cheaper and more sustainable than state-of-the-art techniques relying on physical masks and aggressive chemistries. | ||
At DTU Danchip/Cen, we investigate ice lithography and the steps it needs to be ported from research to future industry, establishing its potential as the break-through technology needed to advance further in the ultra large scale integration semiconductor roadmap. | At DTU Danchip/Cen, we investigate ice lithography and the steps it needs to be ported from research to future industry, establishing its potential as the break-through technology needed to advance further in the ultra large scale integration semiconductor roadmap. | ||