LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes: Difference between revisions
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===Publications in Peer Reviewed Journals=== | ===Publications in Peer Reviewed Journals=== | ||
* | *; Organic Ice Resists | ||
* | *: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, P. Liu, M. Beleggia, and A. Han<br> ''Nano Letters'', vol. 17, pp. 7886-7891, 2017. | ||
*Organic ice resists for 3D electron-beam processing | *; Organic ice resists for 3D electron-beam processing - Instrumentation and operation | ||
<u>W. Tiddi</u>, A. Elsukova, M. Beleggia, and A. Han | *: <u>W. Tiddi</u>, A. Elsukova, M. Beleggia, and A. Han<br> ''Microelectronic Engineering'', vol. 192, pp. 38-43, 2018. | ||
''Microelectronic Engineering'', vol. 192, | |||
*; Inductively coupled plasma nanoetching of atomic layer deposition alumina | |||
A. Han, B. Chang, M. Todeschini, H. T. Le, <u>W. Tiddi</u> and M. Keil | *: A. Han, B. Chang, M. Todeschini, H. T. Le, <u>W. Tiddi</u> and M. Keil<br> ''Microelectronic Engineering'', vol. 193, pp. 28-33, 2018. | ||
''Microelectronic Engineering'', | |||
===Published Patents=== | ===Published Patents=== | ||
*; A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RESIST. | |||
A. Han (Inventor), <u>W. Tiddi</u> (Inventor), M. Beleggia (Inventor) | *: A. Han (Inventor), <u>W. Tiddi</u> (Inventor), M. Beleggia (Inventor)<br> IPC No.: B29C 67/ 00 A I. Patent No.: WO2017191079. Nov 09, 2017. | ||
IPC No.: B29C 67/ 00 A I. Patent No.: WO2017191079. Nov 09, 2017. | |||
===Conferences and Workshops Contributions=== | ===Conferences and Workshops Contributions=== | ||
*; Organic ice resists: condensed small molecules as spin-free volatile E-beam resists | |||
Tiddi, | *: <u>W. Tiddi</u>, A. Elsukova, H. T. Le, M. Beleggia, and A. Han<br> Oral presentation at ''43rd International conference on Micro and Nano Engineering'', Braga, Portugal, 2017. | ||
*; Ice lithography: ice-based nanopatterning | |||
Tiddi | *: <u>W. Tiddi</u><br> Workshop lecture at ''Nordic Nanolab User Meeting 2017'', Trondheim, Norway, 2017. | ||
*; Advances in Ice Lithography in Denmark and China | |||
*: <u>W. Tiddi</u>, D. Zhao, M. Qiu, M. Beleggia, and A. Han<br> Abstract and Poster at ''42nd International conference on Micro and Nano Engineering'', Vienna, Austria, 2016. | |||
Ice lithography : water-based nanopatterning. / | *; Ice lithography : water-based nanopatterning. | ||
*: <u>W. Tiddi</u>, M. Beleggia, and A. Han<br> Abstract and Poster at ''Sustain-ATV Conference 2016'', Kgs. Lyngby, Denmark, 2016. | |||
*; Proximity Effects in a Chemically Amplified Electron Beam Resist Patterned at 100 keV. | |||
*: <u>W. Tiddi</u>, T. Greibe, M. Beleggia, and A. Han<br> Abstract and Poster at ''41st International conference on Micro and Nano Engineering'', The Hague, Netherlands, 2015. | |||
Proximity Effects in a Chemically Amplified Electron Beam Resist Patterned at 100 keV. / | |||
==Ice Lithography== | ==Ice Lithography== | ||