LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes: Difference between revisions

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 =Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes=
 *'''Project type:''' Ph.D. project
-*'''Project responsible:''' William Tiddi
+*'''Project responsible:''' William Tiddi ([http://orbit.dtu.dk/en/persons/william-tiddi(7603153a-3652-4965-8e92-62b3a5deb499).html DTU Orbit])
 *'''Supervisors:''' Assoc. Prof. Marco Beleggia, Assist. Prof. Anpan Han
 *'''Partners involved:''' DTU Danchip/Cen
+*'''Full thesis:''' [[:File:PhDthesisPapers_v2.pdf|Link]]
 ==Project Description==
-[[image:Williams project description.jpg|400px|thumb|Adapted from Han A. et al. (2011) [left] and Han A. et al. (2012) [right]]]
+[[image:ProcessOIR.png|500px|thumb|Lithography process for Organic Ice Resists]]
 Fabrication of micro- and nanostructures, the building blocks of modern electronics and nanotechnology, requires one or more lithography iterations where the desired geometries are defined in a sacrificial layer, the resist, to be transferred into a functional material. A typical lithography process involves
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 We explored, characterized and optimized this novel technology in detail to make it accessible to the broader nanotechnology community. The entire lithography requires no other tool and uses trivial amounts of readily available precursor material; at the same time performances in terms of dose and resolution are comparable to established resists, and the resulting features are directly compatible with established processes developed for resist-based pattern transfer.
+==Dissemination==
+===Publications in Peer Reviewed Journals===
+*'''Organic Ice Resists'''
+**<u>W. Tiddi</u>, A. Elsukova, H. T. Le, P. Liu, M. Beleggia, and A. Han., "Organic Ice Resists", ''Nano Letters'', vol. 17, pp. 7886-7891, 2017.
+*Organic ice resists for 3D electron-beam processing: Instrumentation and operation.<br>
+<u>W. Tiddi</u>, A. Elsukova, M. Beleggia, and A. Han.<br>
+''Microelectronic Engineering'', vol. 192, p. 38-43, 2018.
+====Inductively coupled plasma nanoetching of atomic layer deposition alumina.====
+A. Han, B. Chang, M. Todeschini, H. T. Le, <u>W. Tiddi</u> and M. Keil.
+''Microelectronic Engineering'', Vol. 193, p. 28-33, 2018.
+===Published Patents===
+====A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RESIST.====
+A. Han (Inventor), <u>W. Tiddi</u> (Inventor), M. Beleggia (Inventor).
+IPC No.: B29C 67/ 00 A I. Patent No.: WO2017191079. Nov 09, 2017.
+===Conferences and Workshops Contributions===
+====Organic ice resists: condensed small molecules as spin-free volatile E-beam resists.====
+Tiddi, William; Lê Thanh, Hoà; Elsukova, Anna; Beleggia, Marco; Han, Anpan.
+. Abstract from 43rd International conference on Micro and Nano Engineering, Braga, Portugal.
+====Ice lithography: ice-based nanopatterning.====
+Tiddi, William.
+. Abstract from Nordic Nanolab User Meeting 2017, Trondheim, Norway.
+====Advances in Ice Lithography in Denmark and China.==== Tiddi, William; Zhao, D.; Qiu, M.; Beleggia, Marco; Han, Anpan.
+. Abstract from 42nd International conference on Micro and Nano Engineering, Vienna, Austria.
+Ice lithography : water-based nanopatterning. / Tiddi, William; Beleggia, Marco; Han, Anpan.
+. Abstract from Sustain-ATV Conference 2016, Kgs. Lyngby, Denmark.
+Ice Lithography for Nanodevices. / Han, Anpan; Kuan, A.; Wang, J.; Vlassarev, D.; Golovchenko, J.; Branton, D.; Tiddi, William; Beleggia, Marco.
+. Abstract from 5th Conference on Advances in Optoelectronics and Micro/Nano-optics, Hangzhou, China.
+Proximity Effects in a Chemically Amplified Electron Beam Resist Patterned at 100 keV. / Tiddi, William; Greibe, Tine; Beleggia, Marco; Han, Anpan.
+. Abstract from 41st International conference on Micro and Nano Engineering , The Hague, Netherlands.
 ==Ice Lithography==