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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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|-  
|-  
|1nitride
|1nitride
|30
|20
|1000
|500
|80
|
|
|
|-
|
|qcnitrid
|
|40
|
|20
|
|1960
|550
|60
|The one we test in the quality assurance program.
|-
|-
|}
|}
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