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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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|Deposition rate [Å/min]
|Deposition rate [Å/min]
|RI
|RI
|Uniformity [%]
|Uniformity [%]<br \>[Std./mean]
|Stress [MPa]
|Stress [MPa]
|-  
|-  
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|~117
|~117
|~1.99
|~1.99
|
|~4
|~-30
|~-30
|-
|-
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