Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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'''~2-4%''' (2015-04-24 BGHE)<br> | |||
'''~5%''' in the middel (4") (2014-08-13 BGHE)<br> | '''~5%''' in the middel (4") (2014-08-13 BGHE)<br> | ||
'''~10%''' over 3 wafers (2014-08-13 BGHE) | '''~10%''' over 3 wafers (2014-08-13 BGHE) | ||