Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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==Manual Spinner ( | ==Manual Spinner 1 (Laurell)== | ||
[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] | [[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] | ||
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Revision as of 14:41, 30 May 2013
Coaters: Comparison Table
Equipment | SSE Spinner | KS Spinner | |
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Purpose |
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Performance | Substrate handling |
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Permanent media |
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Manual dispense option |
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Process parameter range | Parameter 1 |
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Parameter 2 |
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Substrates | Batch size |
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Allowed materials |
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SSE Spinner
The SSE spinner MAXIMUS: positioned in Cleanroom 13.
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates.
The system is equipped with 2 different resists lines:
- AZ5214E and
- AZ4562 and
- 2 syringe lines, which can be used for spinning of e-beam resist.
The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager
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Track 1 + 2
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KS Spinner
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Manual Spinner 1 (Laurell)
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