Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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==SSE Spinner== | ==SSE Spinner== | ||
[[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] | [[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] | ||
The SSE spinner MAXIMUS: positioned in Cleanroom 13. | The SSE spinner MAXIMUS: positioned in Cleanroom 13. | ||
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==KS Spinner== | ==KS Spinner== | ||
[[Image:KSspinner.JPG|200×200px| | [[Image:KSspinner.JPG|200×200px|left|thumb|The KS spinner is placed in Cleanroom 3.]] | ||
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==SÜSS Spinner-Stepper== | ==SÜSS Spinner-Stepper== | ||
[[Image:Gamma_2M.jpg|200×200px| | [[Image:Gamma_2M.jpg|200×200px|left|thumb|The SÜSS Spinner-Stepper is placed in Stepper room.]] | ||
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Revision as of 11:17, 30 May 2013
Coaters: Comparison Table
Equipment | SSE Spinner | KS Spinner | |
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Purpose |
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Performance | Substrate handling |
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Permanent media |
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Manual dispense option |
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Process parameter range | Parameter 1 |
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Parameter 2 |
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Substrates | Batch size |
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Allowed materials |
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SSE Spinner
The SSE spinner MAXIMUS: positioned in Cleanroom 13. SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. The system is equipped with 2 different resists lines: AZ5214E and AZ4562 and 2 syringe lines, which can be used for spinning of e-beam resist. The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager
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KS Spinner
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Manual Spinner( Polymers)
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SÜSS Spinner-Stepper
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