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Created page with "==SSE Spinner== 200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13. SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment ..."
 
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==SSE Spinner==
==SSE Spinner==
[[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]]
[[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]]
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning  on 2", 4" and 6" substrates. The system is equipped with 2 different resists lines: AZ5214E and AZ4562 and 2 syringe lines, which can be used for spinning of e-beam resist.
'''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:'''
Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager]


== Process information ==
== Process information ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters"