Specific Process Knowledge/Lithography: Difference between revisions
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==Equipment List== | ==Equipment List== | ||
[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]] | *[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]] | ||
[[Specific Process Knowledge/Lithography/Coaters|Coaters]] | *[[Specific Process Knowledge/Lithography/Coaters|Coaters]] | ||
[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]] | *[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]] | ||
[[Specific Process Knowledge/Lithography/Baking|Baking]] | *[[Specific Process Knowledge/Lithography/Baking|Baking]] | ||
[[Specific Process Knowledge/Lithography/Developing|Developing]] | *[[Specific Process Knowledge/Lithography/Developing|Developing]] | ||
[[Specific Process Knowledge/Lithography/StripLiftOff|Strip, Lift-off]] | *[[Specific Process Knowledge/Lithography/StripLiftOff|Strip, Lift-off]] | ||
[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]] | *[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]] | ||
[[Specific Process Knowledge/Lithography/Characterization|Characterization]] | *[[Specific Process Knowledge/Lithography/Characterization|Characterization]] | ||
[[Specific Process Knowledge/Lithography/LaserWriter|LaserWriter]] | *[[Specific Process Knowledge/Lithography/LaserWriter|LaserWriter]] | ||
[[Specific Process Knowledge/Lithography/EBeamLithography|E-Beam Lithography]] | *[[Specific Process Knowledge/Lithography/EBeamLithography|E-Beam Lithography]] | ||
[[Specific Process Knowledge/Lithography/DUVStepper|DUV Stepper]] | *[[Specific Process Knowledge/Lithography/DUVStepper|DUV Stepper]] | ||
[[Specific Process Knowledge/Lithography/NanoImprintLithography|NanoImprint Lithography]] | *[[Specific Process Knowledge/Lithography/NanoImprintLithography|NanoImprint Lithography]] | ||
[[Specific Process Knowledge/Lithography/3D|3D]] | *[[Specific Process Knowledge/Lithography/3D|3D]] | ||