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Specific Process Knowledge/Etch/Wet Silicon Nitride Etch: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,142 edits
No edit summary
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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!
!
![[Specific Process Knowledge/Etch/Wet Platinum Etch|Pt wet etch]]
! Nitride Etch @ 180 <sup>o</sup>C
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
! Nitride Etch @ 160 <sup>o</sup>C
|-
|-


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