Specific Process Knowledge/Etch/Etching of Bulk Glass: Difference between revisions
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==Wet HF-etch of bulk glass== | ==Wet HF-etch of bulk glass== | ||
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![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Method 1]] | |||
![[Specific Process Knowledge/Thin film deposition/PECVD|Method 2]] | |||
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!Generel description | |||
|Generel description - method 1 | |||
|Generel description - method 2 | |||
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!Parameter 1 | |||
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*A | |||
*B | |||
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! Fused silica | ! Fused silica | ||
! Borofloat glass | ! Borofloat glass | ||
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|'''General description''' | |'''General description''' | ||
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*40% pre-mixed HF | *40% pre-mixed HF | ||
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|'''Possible masking materials''' | |'''Possible masking materials''' | ||
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