Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions
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[[image:Surfscan_at_FAT.JPG|300x300px|right|thumb|The image is from the cleanroom at the place it was refurbish in California.]] | [[image:Surfscan_at_FAT.JPG|300x300px|right|thumb|The image is from the cleanroom at the place it was refurbish in California.]] | ||
Particle counting of an unpatterned surface. A broad range of particles size from 0. | Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles. | ||
Revision as of 08:18, 28 May 2013
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KLA-Tencor Surfscan 6420
Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.
Purpose |
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Performance | Particles size |
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Througput |
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Repeatbility |
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Process parameter range | Process Temperature |
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Process pressure |
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Substrates | Batch size |
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Substrate material allowed |