Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions

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KLA-Tencor Surfscan 6420

Particle counting of an unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films as e.g. Poly-si, Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.

Overview of the performance of the Surfscan 6420 and some process related parameters

Purpose		Particles counting
Performance	Particles size	0.1 µm to 3 µm
	Througput	Up to 100 wafer per hour (200 mm)
	Repeatbility	Within 1%, 1σ (mean count > 500, 0,204 µm diameter latex spheres)
Process parameter range	Process Temperature	Room temperature
Process parameter range	Process pressure	1 atm
Substrates	Batch size	Small wafer pieces can all be used 1-25 100 mm wafers 1-25 150 mm wafers 1-25 200 mm wafers
Substrates	Substrate material allowed

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	[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]		[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]

	~~Particles~~ counting of a unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films as e.g. Poly-si, Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it not count as ~~a particle~~.		Particle counting of an unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films as e.g. Poly-si, Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.