Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions

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	[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]		[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]

	~~Particles~~ counting of a unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films as e.g. Poly-si, Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it not count as ~~a particle~~.		Particle counting of an unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films as e.g. Poly-si, Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.