Specific Process Knowledge/Etch/Etching of Bulk Glass: Difference between revisions
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== Comparing methods for | == Comparing methods for etching bulk glass at Danchip == | ||
Etching of Glass can be done either wet or dry. Wet etching is done with HF. Dry etching can be done either with [[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)|AOE]] using Flourine chemistry (only fused silica) or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions and/or using Flourine chemistry. | Etching of Glass can be done either wet or dry. Wet etching is done with HF. Dry etching can be done either with [[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)|AOE]] using Flourine chemistry (only fused silica) or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions and/or using Flourine chemistry. | ||