Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
New page: == Etching using the dry etch technique AOE (Advanced oxide etch) == The AOE positioned at DANCHIP is owned by the company Hymite who is a user of the DANCHIP laboratory. The system is fre... |
|||
| Line 31: | Line 31: | ||
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Gas flows | |style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *C<math>_4</math>F<math>_8</math>: sccm | ||
*O<math>_2</math>: sccm | *O<math>_2</math>: sccm | ||
*CF<math>_4</math>: sccm | *CF<math>_4</math>: sccm | ||
*H<math>_2</math>: sccm | *H<math>_2</math>: sccm | ||
* | *He: sccm | ||
*N<math>_2</math>: sccm | *N<math>_2</math>: sccm | ||
|- | |- | ||