Specific Process Knowledge/Etch/Etching of Bulk Glass: Difference between revisions
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*~800 nm/min (non-patterned silica, slow stirring) | *~800 nm/min (non-patterned silica, slow stirring) | ||
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*~3 | *~3.9 µm/min | ||
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|-valign="top" | |-valign="top" | ||
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= This section is under construction [[Image:section under construction.jpg|70px]]= | = This section is under construction [[Image:section under construction.jpg|70px]]= | ||