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Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions

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Etch of silicon can be done by either wet etch or dry etch. The standard setups for this here at DANCHIP are:
Etch of silicon can be done by either wet etch or dry etch. The standard setups for this here at DANCHIP are:
===Dry etches:===
*[[/Si etch using RIE1 or RIE2|Si etch using RIE1 or RIE2]]
*[[/Si etch using ASE|Si etch using ASE (Advanced Silicon Etch)]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus|Si etch using DRIE-Pegasus (Silicon Etch)]]
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch|Si etch using IBE/IBSD Ionfab 300]]
==Comparison of KOH etch, wet PolySilicon etch, RIE etch, ASE etch and DRIE-Pegasus for etching of Silicon==
==Comparison of KOH etch, wet PolySilicon etch, RIE etch, ASE etch and DRIE-Pegasus for etching of Silicon==
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