Specific Process Knowledge/Thin film deposition/Deposition of Tungsten: Difference between revisions
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| Layer thickness | | Layer thickness | ||
|10Å to | |10Å to 5000Å | ||
|- | |- | ||
| Deposition rate | | Deposition rate | ||
|2Å/s to 15Å/s | |2Å/s to 15Å/s | ||
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|-style="background:WhiteSmoke; color:black" | |||
!Allowed materials | |||
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* Silicon | |||
* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
* Metals | |||
|-style="background:Lightgrey; color:black" | |||
!Comments | |||
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|} | |} | ||