Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
| Line 189: | Line 189: | ||
*Isotropic etch in crystalline silicon and polysilicon | *Isotropic etch in crystalline silicon and polysilicon | ||
| | | | ||
*Can etch isotropic and anisotropic depending on the process parameters | *Can etch isotropic and anisotropic depending on the process parameters and mask design. | ||
| | | | ||
*State-of-the-art dry silicon etcher with atmospheric cassette loader | *State-of-the-art dry silicon etcher with atmospheric cassette loader | ||