Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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*[[/SiO2 etch using RIE1 or RIE2|SiO2 etch using RIE1 or RIE2]] | *[[/SiO2 etch using RIE1 or RIE2|SiO2 etch using RIE1 or RIE2]] | ||
*[[/SiO2 etch using AOE|SiO2 etch using AOE]] | *[[/SiO2 etch using AOE|SiO2 etch using AOE]] | ||
*[[Specific Process Knowledge/Etch/IBE | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | ||
==Compare the methods for Silicon Oxide etching== | ==Compare the methods for Silicon Oxide etching== | ||