Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
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!Substrate size | !Substrate size | ||
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*25 wafers of 100mm in our 100mm bath | *<nowiki>#</nowiki>25 wafers of 100mm in our 100mm bath | ||
*1-5 wafers of 100mm or 50mm in "Fumehood KOH" | *<nowiki>#</nowiki>1-5 wafers of 100mm or 50mm in "Fumehood KOH" | ||
*25 wafers of 100mm or 150mm in our 6" bath | *<nowiki>#</nowiki>25 wafers of 100mm or 150mm in our 6" bath | ||
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*<nowiki>#</nowiki>25 100 mm wafers in our 100mm bath | *<nowiki>#</nowiki>25 100 mm wafers in our 100mm bath | ||
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*As many small samples as can be fitted on the 100mm carrier. | *As many small samples as can be fitted on the 100mm carrier. | ||
*1 100mm wafer (or smaller with carrier) | *<nowiki>#</nowiki>1 100mm wafer (or smaller with carrier) | ||
*1 150mm wafer (only when the system is set up for 150mm) | *<nowiki>#</nowiki>1 150mm wafer (only when the system is set up for 150mm) | ||
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*As many small samples as can be fitted on a 100mm wafer | *As many small samples as can be fitted on a 100mm wafer | ||