Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
Appearance
| Line 336: | Line 336: | ||
*Aluminium | *Aluminium | ||
| | | | ||
* | *Silicon wafers | ||
*Layers of | |||
**Photoresist/e-beam resist | |||
**PolySilicon, Silicon oxide or silicon (oxy)nitride | |||
**Aluminium, titanium or chromium | |||
*Quartz wafers | |||
| | | | ||
* | * | ||