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Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions

BGE (talk | contribs)
BGE (talk | contribs)
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*E-beam resist
*E-beam resist
*Other metals if they cover less than 5% of the wafer area (ONLY RIE2!)
*Other metals if they cover less than 5% of the wafer area (ONLY RIE2!)
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*Allowed material 1
*Silicon
*Allowed material 2
*Silicon Oxide
*Allowed material 3
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*zep resist
*Aluminium oxide
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*Allowed material 1
*Silicon
*Allowed material 2
*Silicon Oxide
*Allowed material 3
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
*Aluminium
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