Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions
| Line 74: | Line 74: | ||
*Oxygen plasma | *Oxygen plasma | ||
*Oxygen plasma mixed with | *Oxygen plasma mixed with | ||
** | **CO<sub>2</sub> | ||
** | **SF<sub>6</sub> | ||
**Ar | **Ar | ||
| | | | ||
*Oxygen plasma | *Oxygen plasma | ||
*Oxygen plasma mixed with | *Oxygen plasma mixed with | ||
** | **CF<sub>4</sub> | ||
| | | | ||
*Oxygen plasma | *Oxygen plasma | ||
| Line 86: | Line 86: | ||
*Oxygen plasma | *Oxygen plasma | ||
*Oxygen plasma mixed with | *Oxygen plasma mixed with | ||
** | **CF<sub>4</sub> | ||
** | **SF<sub>6</sub> | ||
| | | | ||
*The different solvents available at Danchip, such as | *The different solvents available at Danchip, such as | ||