Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions
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! | !Possible etch reactances | ||
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* | *Oxygen plasma | ||
* | *Oxygen plasma mixed with | ||
* | **CH4 | ||
**CF4 | |||
**SF6 | |||
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* | *Oxygen plasma | ||
*Oxygen plasma mixed with | |||
**CF4 | |||
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* | *Oxygen plasma | ||
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* | *Oxygen plasma | ||
*Oxygen plasma mixed with | |||
**CF4 | |||
**SF6 | |||
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* | *The different solvents available at Danchip, such as | ||
**Acetone | |||
**1165 Remover | |||
**? | |||
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