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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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!Parameter 2
!Possible etch reactances
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*A
*Oxygen plasma
*B
*Oxygen plasma mixed with
*C
**CH4
**CF4
**SF6
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*A
*Oxygen plasma
*Oxygen plasma mixed with
**CF4
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*A
*Oxygen plasma
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*A
*Oxygen plasma
*Oxygen plasma mixed with
**CF4
**SF6
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*A
*The different solvents available at Danchip, such as
**Acetone
**1165 Remover
**?
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