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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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2,908 edits
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![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|ASE]]
![[Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch)|ASE]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Plasma asher 1]]
![[Specific Process Knowledge/Photolithography/Stripping equipment#Plasma_asher_1|Plasma asher 1]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Plasma asher 2]]
![[Specific Process Knowledge/Photolithography/Stripping equipment#Plasma_asher_2|Plasma asher 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|RIE2]]
![[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|By wet etch]]
![[Specific Process Knowledge/Etch/Wet Polymer Etch|By wet etch]]




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