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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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Bureaucrats, danchip, Administrators
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BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 164: Line 164:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Parameter 1
!Parameter 1
|
*A
*B
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*A
*B
|
*A
*B
|
|
*A
*A
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*B
*B
*C
*C
|
*A
|
*A
|
*A
|
|
*A
*A
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Substrate size
!Substrate size
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|
|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> small samples
Line 209: Line 239:
*Allowed material 2
*Allowed material 2
*Allowed material 3
*Allowed material 3
|
*Allowed material 1
*Allowed material 2
|
*Allowed material 1
*Allowed material 2
|
*Allowed material 1
*Allowed material 2
|-
|-
|}
|}


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