Specific Process Knowledge/Etch/Etching of Platinum: Difference between revisions
Appearance
Created page with " =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= '''Feedback to this page''': '''[mailto:labadviser@danchi..." |
|||
| Line 7: | Line 7: | ||
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]''' | ||
==Etching of | ==Etching of Platinum== | ||
Etching of | Etching of Platinum can be done either by wet etch or by sputtering with ions. | ||
*[[Specific Process Knowledge/Etch/Wet | *[[Specific Process Knowledge/Etch/Wet Platinum Etch|Etching of Platinum by wet etch]] | ||
*[[Specific_Process_Knowledge/Etch/IBE⁄IBSD Ionfab 300 | *[[Specific_Process_Knowledge/Etch/IBE⁄IBSD Ionfab 300|Sputtering of Pt]] | ||
<br clear="all" /> | <br clear="all" /> | ||