Specific Process Knowledge/Thin film deposition/Deposition of Tantalum: Difference between revisions
No edit summary |
No edit summary |
||
| Line 9: | Line 9: | ||
! | ! | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]]) | ||
! Sputter (Lesker) | ! Sputter ([[Specific_Process_Knowledge/Thin_film_deposition/Lesker|Lesker]]) | ||
|- | |- | ||
| Batch size | | Batch size | ||