Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Generel description | !Generel description | ||
|Wet etch of Cr premixed (Chrome etch 18) | |||
|Wet etch of Cr that you need to mix your self | |Wet etch of Cr that you need to mix your self | ||
|Dry plasma etch of Cr | |Dry plasma etch of Cr | ||
|Sputtering of Cr - pure physical etch | |Sputtering of Cr - pure physical etch | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Etch rate range | !Etch rate range | ||
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*~?nm/min | |||
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*~40-100nm/min | *~40-100nm/min | ||
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*~14 nm/min (depending on features size and etch load) | *~14 nm/min (depending on features size and etch load) | ||