Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
| Line 43: | Line 43: | ||
*~?nm/min | *~?nm/min | ||
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*~ | *~14 nm/min (depending on features size and etch load) | ||
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*~30nm/min (not tested yet) | *~30nm/min (not tested yet) | ||
| Line 43: | Line 43: | ||
*~?nm/min | *~?nm/min | ||
| | | | ||
*~ | *~14 nm/min (depending on features size and etch load) | ||
| | | | ||
*~30nm/min (not tested yet) | *~30nm/min (not tested yet) | ||