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| Ething of Chromium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | | Ething of Chromium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. |
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| ==Wet etching of Chromium==
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| [[Image:fumehoodetch-chrom.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Chromium can take place in a beaker in this fume hood]]
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| Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this:
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| # HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g - standard at Danchip
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| # Commercial chromium etch
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| Etch rate are depending on the level of oxidation of the metal.
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| ====How to mix the Chromium etch 1:====
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| #Take a beaker and add 15g of cerisulphate.
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| #Add a little water while stirring - make sure all lumps are gone.
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| #Add water until 600 ml - keep stirring (use magnetic stirring)
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| #Add 90 ml HNO<sub>3</sub>
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| #When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer.
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| <br clear="all" />
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| ===Overview of the data for the chromium etches===
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| {| border="1" cellspacing="0" cellpadding="4"
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| !
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| ! Chromium etch 1
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| ! Chromium etch 2
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| |-
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| | '''General description'''
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| Etch of chromium
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| Etch of chromium
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| |-
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| | '''Chemical solution'''
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| |HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g
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| |.
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| |-
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| | '''Process temperature'''
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| |Room temperature
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| |-
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| | '''Possible masking materials'''
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| Photoresist (1.5 µm AZ5214E)
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| .
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| |-
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| |'''Etch rate'''
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| ~40-100 nm/min
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| .
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| |-
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| |'''Batch size'''
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| 1-25 wafers at a time
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| .
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| |-
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| |'''Size of substrate'''
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| 4" wafers
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| .
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| |-
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| |'''Allowed materials'''
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| No restrictions.
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| Make a note on the bottle of which materials have been processed.
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| .
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| |-
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| |}
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| == Dry etching of chromium == | | == Dry etching of chromium == |
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| On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. | | On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. |
