Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
| Line 42: | Line 42: | ||
*~60nm/min (Al+1.5% Si) | *~60nm/min (Al+1.5% Si) | ||
| | | | ||
* | *~350 nm/min (depending on features size and etch load) | ||
| | | | ||
* | * | ||
|- | |- | ||
| Line 42: | Line 42: | ||
*~60nm/min (Al+1.5% Si) | *~60nm/min (Al+1.5% Si) | ||
| | | | ||
* | *~350 nm/min (depending on features size and etch load) | ||
| | | | ||
* | * | ||
|- | |- | ||