Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
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![[Specific Process Knowledge/ | ![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 1]] | ||
![[Specific Process Knowledge/ | ![[Specific Process Knowledge/Etch/Wet Aluminium Etch|Al wet etch 2]] | ||
![[ | ![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|Al etch by ICP metal]] | ||
![[ | ![[Specific_Process_Knowledge/Etch/IBE⁄IBSD Ionfab 300|Al sputtering by IBE (Ionfab300+)]] | ||
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Revision as of 09:57, 12 March 2013
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Etching of Aluminium
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions.
Comparison methode 1 and methode 2 for the process
Al wet etch 1 | Al wet etch 2 | Al etch by ICP metal | Al sputtering by IBE (Ionfab300+) | |
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Generel description | Generel description - methode 1 | Generel description - methode 2 | ||
Parameter 1 |
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Parameter 2 |
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Substrate size |
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Allowed materials |
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