Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
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Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions. | Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions. | ||
*[[/ | *[[Specific Process Knowledge/Etch/Wet Aluminium Etch|Etching of Al by wet etch]] | ||
*[[/Deposition of silicon nitride using LPCVD|Etching of Al by dry etch]] | *[[/Deposition of silicon nitride using LPCVD|Etching of Al by dry etch]] | ||
*[[/Deposition of silicon nitride using LPCVD|Etching of Al by sputering]] | *[[/Deposition of silicon nitride using LPCVD|Etching of Al by sputering]] | ||
Revision as of 09:49, 12 March 2013
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Etching of Aluminium
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions.
Comparison methode 1 and methode 2 for the process
| Methode 1 | Methode 2 | |
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| Generel description | Generel description - methode 1 | Generel description - methode 2 |
| Parameter 1 |
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| Parameter 2 |
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| Substrate size |
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| Allowed materials |
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