Specific Process Knowledge/Characterization/XPS: Difference between revisions
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== | ==Equipment performance of XPS-ThermoScientific== | ||
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* Depth profiling possible by ion beam etch of sample | * Depth profiling possible by ion beam etch of sample | ||
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!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"||rowspan="5"| Performance | ||
|style="background:LightGrey; color:black"|Spot size | |style="background:LightGrey; color:black"|Spot size | ||
|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm | |style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm | ||