Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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|Recommended for unexposed e-beam resist | |Recommended for unexposed e-beam resist | ||
|-style="background:LightGrey; color:black" | |||
! Allowed substrates | |||
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* Silicon wafers | |||
* Quartz wafers | |||
* Pyrex wafers | |||
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* Silicon wafers | |||
* Quartz wafers | |||
* Pyrex wafers | |||
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* Silicon wafers | |||
* Quartz wafers | |||
* Pyrex wafers | |||
|-style="background:WhiteSmoke; color:black" | |||
!Allowed materials | |||
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* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
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* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
| | |||
* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
|} | |} | ||
Substrate material allowed Silicon wafers | |||
Quartz wafers | |||
Pyrex wafers | |||
Material allowed on the substrate Silicon oxide | |||
Silicon (oxy)nitride | |||
Photoresist | |||
PMMA | |||
Mylar | |||
SU-8 | |||
Any metals | |||
==Aluminium deposition on ZEP520A for lift-off== | ==Aluminium deposition on ZEP520A for lift-off== | ||