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Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

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|About 1Å/s
|About 1Å/s
|Dependent on [[/Sputter rates for Al PVD co-sputter/evaporation|process parameters]] (about 1 Å/s).
|Dependent on [[/Sputter rates for Al PVD co-sputter/evaporation|process parameters]] (about 1 Å/s).
|Depending on process parameters (see [[/Sputter rates for Al|here]]), up to ~2.5 Å/s
|Depending on [[/Sputter rates for Al|process parameters]], up to ~2.5 Å/s
|~2Å/s to 15Å/s
|~2Å/s to 15Å/s
|-
|-
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